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Christer Hedlund
Christer Hedlund
Mid Sweden University, Quality Technology
Dirección de correo verificada de miun.se
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Role of fluorocarbon film formation in the etching of silicon, silicon dioxide, silicon nitride, and amorphous hydrogenated silicon carbide
T Standaert, C Hedlund, EA Joseph, GS Oehrlein, TJ Dalton
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (1 …, 2004
3322004
Microloading effect in reactive ion etching
C Hedlund, HO Blom, S Berg
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 12 (4 …, 1994
1901994
Oxidation and induced damage in oxygen plasma in situ wafer bonding
D Pasquariello, C Hedlund, K Hjort
Journal of the Electrochemical Society 147 (7), 2699, 2000
782000
Selective -to- etching in inductively coupled fluorocarbon plasmas: Angular dependence of and etching rates
M Schaepkens, GS Oehrlein, C Hedlund, LB Jonsson, HO Blom
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (6 …, 1998
721998
Anisotropic etching of Z-cut quartz
C Hedlund, U Lindberg, U Bucht, J Soderkvist
Journal of Micromechanics and Microengineering 3 (2), 65, 1993
721993
Etch rates of crystallographic planes in Z-cut quartz-experiments and simulation
P Rangsten, C Hedlund, IV Katardjiev, Y Bäcklund
Journal of Micromechanics and Microengineering 8 (1), 1, 1998
661998
Surface energy as a function of self-bias voltage in oxygen plasma wafer bonding
D Pasquariello, M Lindeberg, C Hedlund, K Hjort
Sensors and Actuators A: Physical 82 (1-3), 239-244, 2000
602000
Compositional variations of sputter deposited Ti/W barrier layers on substrates with pronounced surface topography
LB Jonsson, C Hedlund, IV Katardjiev, S Berg
Thin Solid Films 348 (1-2), 227-232, 1999
411999
More value from fewer resources: how to expand value stream mapping with ideas from circular economy
C Hedlund, P Stenmark, E Noaksson, J Lilja
International Journal of Quality and Service Sciences 12 (4), 447-459, 2020
332020
Storytelling: a co-creative process to support value-based leadership
K Snyder, C Hedlund, P Ingelsson, I Bäckström
International Journal of Quality and Service Sciences 9 (3/4), 484-497, 2017
322017
Angular dependence of the polysilicon etch rate during dry etching in and
C Hedlund, LB Jonsson, IV Katardjiev, S Berg, HO Blom
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (3 …, 1997
311997
Discharge disruptions in a helicon plasma source
KP Shamrai, VF Virko, HO Blom, VP Pavlenko, VB Taranov, LB Jonsson, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (6 …, 1997
251997
Oxygen plasma wafer bonding evaluated by the Weibull fracture probability method
K Jonsson, J Köhler, C Hedlund, L Stenmark
Journal of Micromechanics and Microengineering 11 (4), 364, 2001
222001
Method for the determination of the angular dependence during dry etching
C Hedlund, C Strandman, IV Katardjiev, Y Bäcklund, S Berg, HO Blom
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1996
201996
Capturing value-based leadership in practice: Insights from developing and applying an AI-interview guide
I Bäckström, P Ingelsson, K Snyder, C Hedlund, J Lilja
International Journal of Quality and Service Sciences 10 (4), 422-430, 2018
182018
Residual stress in sputtered gold films on quartz measured by the cantilever beam deflection technique
G Thornell, F Ericson, C Hedlund, J Ohrmaim, JA Schweitz, G Portnoff
IEEE transactions on ultrasonics, ferroelectrics, and frequency control 46 …, 1999
181999
Membrane covered electrically isolated through-wafer via holes
D Rosén, J Olsson, C Hedlund
Journal of Micromechanics and Microengineering 11 (4), 344, 2001
162001
Oehrlein GS and Dalton TJ
T Standaert, C Hedlund, EA Joseph
J. Vac. Sci. Technol. A 2004, 22, 2004
122004
Direct bonded quartz resonators
O Vallin, B Einefors, C Hedlund, G Thornell
Proceedings of the 2001 IEEE International Frequncy Control Symposium and …, 2001
102001
Patterning of tantalum pentoxide, a high epsilon material, by inductively coupled plasma etching
LB Jonsson, J Westlinder, F Engelmark, C Hedlund, J Du, U Smith, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
92000
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Artículos 1–20