| Scatterometry-based metrology for SAQP pitch walking using virtual reference T Kagalwala, A Vaid, S Mahendrakar, M Lenahan, F Fang, P Isbester, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 14 | 2016 |
| Gamma‐irradiation effects on polypropylene‐based composites with and without an internal lubricant W Brostow, S Deshpande, K Fan, S Mahendrakar, D Pietkiewicz, ... Polymer Engineering & Science 49 (5), 1035-1041, 2009 | 11 | 2009 |
| Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference T Kagalwala, A Vaid, S Mahendrakar, M Lenahan, F Fang, P Isbester, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (4), 044004-044004, 2016 | 10 | 2016 |
| Measurement system and method for measuring in thin films C Bozdog, A Vaid, S Mahendrakar, M Hossain, T Kagalwala US Patent 10,030,971, 2018 | 9 | 2018 |
| Large scale in silico screening on grid infrastructures N Jacq, V Breton, HY Chen, LY Ho, M Hofmann, HC Lee, Y Legre, SC Lin, ... arXiv preprint cs/0611084, 2006 | 9 | 2006 |
| Hybrid enabled thin film metrology using XPS and optical A Vaid, G Iddawela, S Mahendrakar, M Lenahan, M Hossain, P Timoney, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 6 | 2016 |
| Grid-enabled high throughput virtual screening N Jacq, V Breton, HY Chen, LY Ho, M Hofmann, HC Lee, Y Legré, SC Lin, ... Distributed, High-Performance and Grid Computing in Computational Biology …, 2007 | 5 | 2007 |
| Optical metrology solutions for 10nm films process control challenges S Mahendrakar, A Vaid, K Venkataraman, M Lenahan, S Seipp, F Fang, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 3 | 2016 |
| Measuring complex structures in semiconductor fabrication S Mahendrakar, T Kagalwala, A Vaid, M Sendelbach US Patent 10,664,638, 2020 | 2* | 2020 |
| Complex metrology on 3D structures using multi-channel OCD T Kagalwala, S Mahendrakar, A Vaid, PK Isbester, A Cepler, C Kang, ... Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | 2 | 2017 |
| Optical metrology strategies for inline 7nm CMOS logic product control M Lenahan, S Mahendrakar, A Vaid, T Kagalwala, K Venkataraman, D Hu, ... Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | 2 | 2017 |
| Maleic anhydride grafted polypropylene coatings on steel: adhesion and wear W Brostow University of North Texas, 2010 | 2 | 2010 |
| Maleic Anhydride grafted polypropylene coatings on steel: adhesion and wear, 2010 S MAHENDRAKAR, B Tech Thesis (MSC)–University of North Texas, 0 | 2 | |
| Process control of semiconductor fabrication based on linkage between different fabrication steps P Timoney, T Kagalwala, A Vaid, S Mahendrakar, D Dixit, S Yogev, ... US Patent App. 16/288,152, 2020 | | 2020 |
| Manufacturing excellence using multi-platform ellipsometry thickness measurement fleet on advanced nodes M Lenahan, A Vaid, S Mahendrakar, S Seipp, D Jayez, A Yueh, S Saxena, ... 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2016 | | 2016 |
Witold BrostowRegents Professor of Materials Science & Engineering, University of North TexasVerified email at unt.edu
