| Fabrication and preliminary testing of X-ray lenses in thick SU-8 resist layers V Nazmov, E Reznikova, J Mohr, A Snigirev, I Snigireva, S Achenbach, ... Microsystem Technologies 10, 716-721, 2004 | 67 | 2004 |
| Influence of developer temperature and resist material on the structure quality in deep X-ray lithography FJ Pantenburg, S Achenbach, J Mohr Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998 | 64 | 1998 |
| Characterisation of defects in very high deep-etch X-ray lithography microstructures FJ Pantenburg, S Achenbach, J Mohr Microsystem technologies 4, 89-93, 1998 | 55 | 1998 |
| Microfluidic devices for the detection of viruses: Aspects of emergency fabrication during the COVID-19 pandemic and other outbreaks JA Berkenbrock, R Grecco-Machado, S Achenbach Proceedings of the Royal Society A 476 (2243), 20200398, 2020 | 52 | 2020 |
| New development strategies for high aspect ratio microstructures J Zanghellini, S Achenbach, A El-Kholi, J Mohr, FJ Pantenburg Microsystem Technologies 4, 94-97, 1998 | 42 | 1998 |
| X-ray lithography for devices with high aspect ratio polymer submicron structures T Mappes, S Achenbach, J Mohr Microelectronic engineering 84 (5-8), 1235-1239, 2007 | 41 | 2007 |
| Polymer-based resonator antennas A Rashidian, D Klymyshyn, MT Aligodarz, SC Achenbach, MW Börner US Patent 10,361,487, 2019 | 40 | 2019 |
| High aspect ratio vertical cantilever RF-MEMS variable capacitor DM Klymyshyn, DT Haluzan, M Borner, S Achenbach, J Mohr, T Mappes IEEE Microwave and Wireless Components Letters 17 (2), 127-129, 2007 | 29 | 2007 |
| Reducing pull-in voltage by adjusting gap shape in electrostatically actuated cantilever and fixed-fixed beams DT Haluzan, DM Klymyshyn, S Achenbach, M Börner Micromachines 1 (2), 68-81, 2010 | 26 | 2010 |
| Low-profile artificial grid dielectric resonator antenna arrays for mm-wave applications W Mazhar, DM Klymyshyn, G Wells, AA Qureshi, M Jacobs, S Achenbach IEEE Transactions on Antennas and Propagation 67 (7), 4406-4417, 2019 | 24 | 2019 |
| Process conditions in x-ray lithography for the fabrication of devices with sub-micron feature sizes T Mappes, S Achenbach, J Mohr Microsystem technologies 13, 355-360, 2007 | 24 | 2007 |
| Deep sub micron high aspect ratio polymer structures produced by hard X-ray lithography S Achenbach Microsystem technologies 10, 493-497, 2004 | 23 | 2004 |
| Numerical simulation of thermal distortions in deep and ultra deep X-ray lithography S Achenbach, FJ Pantenburg, J Mohr Microsystem technologies 9, 220-224, 2003 | 22 | 2003 |
| Micromachined multigroove silicon ATR FT-IR internal reflection elements for chemical imaging of microfluidic devices TA Morhart, ST Read, G Wells, M Jacobs, SM Rosendahl, S Achenbach, ... Analytical methods 11 (45), 5776-5783, 2019 | 21 | 2019 |
| Attenuated Total Reflection Fourier Transform Infrared (ATR FT-IR) Spectromicroscopy Using Synchrotron Radiation and Micromachined Silicon Wafers for Microfluidic Applications TA Morhart, S Read, G Wells, M Jacobs, SM Rosendahl, S Achenbach, ... Applied Spectroscopy 72 (12), 1781-1789, 2018 | 19 | 2018 |
| High vertical aspect ratio LIGA microwave 3-dB coupler AA Kachayev, DM Klymyshyn, S Achenbach, V Saile Proceedings International Conference on MEMS, NANO and Smart Systems, 38-43, 2003 | 19 | 2003 |
| Structure quality in deep X-ray lithography applying commercial polyimide-based masks S Achenbach, M Boerner, S Kinuta, W Bacher, J Mohr, V Saile, ... Microsystem technologies 13, 349-353, 2007 | 17 | 2007 |
| Optimization of the process conditions for the fabrication of microstructures by ultra deep X-ray lithography (UDXRL) S Achenbach Ph. D. Thesis, Wissenschaftliche Berichte, Forschungszentrum Karlsruhe, 2000 | 16 | 2000 |
| Fabrication of RF MEMS variable capacitors by deep X-ray lithography and electroplating S Achenbach, D Klymyshyn, D Haluzan, T Mappes, G Wells, J Mohr Microsystem technologies 13, 343-347, 2007 | 15 | 2007 |
| Application of Scanning Probe Microscopy for the determination of the structural accuracy of high aspect ratio microstructures S Achenbach, J Mohr, FJ Pantenburg Microelectronic engineering 53 (1-4), 637-640, 2000 | 15 | 2000 |
Timo MappesFriedrich-Schiller-Universität Jena (FSU), Deutsches Optisches Museum (D.O.M.)E-mail confirmado em kit.edu
