M. David Henry
M. David Henry
Sandia National Labs - Principle Member of the Technical Staff
Dirección de correo verificada de sandia.gov
Citado por
Citado por
Alumina etch masks for fabrication of high-aspect-ratio silicon micropillars and nanopillars
MD Henry, S Walavalkar, A Homyk, A Scherer
Nanotechnology 20 (25), 255305, 2009
Tunable visible and near-IR emission from sub-10 nm etched single-crystal Si nanopillars
SS Walavalkar, CE Hofmann, AP Homyk, MD Henry, HA Atwater, ...
Nano letters 10 (11), 4423-4428, 2010
Chemical sensing and/or measuring devices and methods
AP Homyk, MD Henry, A Scherer, S Walavalkar
US Patent 9,018,684, 2015
Ga+ beam lithography for nanoscale silicon reactive ion etching
MD Henry, MJ Shearn, B Chhim, A Scherer
Nanotechnology 21 (24), 245303, 2010
ICP etching of silicon for micro and nanoscale devices
MD Henry
California Institute of Technology, 2010
Pyroelectric response in crystalline hafnium zirconium oxide (Hf1-xZrxO2) thin films
JFI S. W. Smith, A. R. Kitahara, M. A. Rodriguez, M. D. Henry, M. T. Brumbach
Applied Physics Letters 110 (072901), 2017
Advanced plasma processing: etching, deposition, and wafer bonding techniques for semiconductor applications
M Shearn, X Sun, MD Henry, A Yariv, A Scherer
Semiconductor technologies, 79-104, 2010
Size tunable visible and near-infrared photoluminescence from vertically etched silicon quantum dots
SS Walavalkar, AP Homyk, CE Hofmann, MD Henry, C Shin, HA Atwater, ...
Applied Physics Letters 98 (15), 153114, 2011
Techniques of cryogenic reactive ion etching in silicon for fabrication of sensors
MD Henry, C Welch, A Scherer
Journal of Vacuum Science & Technology A 27 (5), 1211-1216, 2009
Radial pn junction, wire array solar cells
BM Kayes, MA Filler, MD Henry, JR Maiolo Iii, MD Kelzenberg, ...
2008 33rd IEEE Photovoltaic Specialists Conference, 1-5, 2008
Controllable deformation of silicon nanowires with strain up to 24%
SS Walavalkar, AP Homyk, MD Henry, A Scherer
Journal of Applied Physics 107 (12), 124314, 2010
Surface encapsulation for low-loss silicon photonics
M Borselli, TJ Johnson, CP Michael, MD Henry, O Painter
Applied Physics Letters 91 (13), 131117-131117-3, 2007
Three-dimensional etching of silicon for the fabrication of low-dimensional and suspended devices
SS Walavalkar, AP Homyk, MD Henry, A Scherer
Nanoscale 5 (3), 927-931, 2013
Methods for fabrication of high aspect ratio micropillars and nanopillars
MD Henry, AP Homyk, A Scherer, S Walavalkar
US Patent 8,148,264, 2012
Methods for fabricating passivated silicon nanowires and devices thus obtained
A Scherer, S Walavalkar, MD Henry, AP Homyk
US Patent 8,080,468, 2011
Methods for designing, fabricating, and predicting shape formations in a material
M Shearn, MD Henry, A Scherer
US Patent 8,557,613, 2013
Stress dependent oxidation of sputtered niobium and effects on superconductivity
MD Henry, S Wolfley, T Monson, BG Clark, E Shaner, R Jarecki
Journal of Applied Physics 115 (8), 083903, 2014
Method for fabricating micro and nanostructures in a material
MD Henry, M Shearn, A Scherer
US Patent 8,557,612, 2013
Methods for fabricating high aspect ratio probes and deforming high aspect ratio nanopillars and micropillars
MD Henry, AP Homyk, A Scherer, TA Tombrello, S Walavalkar
US Patent 9,005,548, 2015
Frequency Trimming of Aluminum Nitride Microresonators Using Rapid Thermal Annealing
MD Henry, J Nguyen, TR Young, T Bauer, RH Olsson
JMEMS, 1-1, 2013
El sistema no puede realizar la operación en estos momentos. Inténtalo de nuevo más tarde.
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