| Evolutionary PERC+ solar cell efficiency projection towards 24% evaluating shadow-mask-deposited poly-Si fingers below the Ag front contact as next improvement step T Dullweber, M Stöhr, C Kruse, F Haase, M Rudolph, B Beier, P Jäger, ... Solar Energy Materials and Solar Cells 212, 110586, 2020 | 51 | 2020 |
| Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering M Rudolph, N Brenning, MA Raadu, H Hajihoseini, JT Gudmundsson, ... Plasma Sources Science and Technology 29 (5), 05LT01, 2020 | 41 | 2020 |
| Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength N Brenning, A Butler, H Hajihoseini, M Rudolph, MA Raadu, ... Journal of Vacuum Science & Technology A 38 (3), 2020 | 40 | 2020 |
| Influence of backscattered neutrals on the grain size of magnetron-sputtered TaN thin films M Rudolph, D Lundin, E Foy, M Debongnie, MC Hugon, T Minea Thin Solid Films 658, 46-53, 2018 | 28 | 2018 |
| Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge M Rudolph, N Brenning, H Hajihoseini, MA Raadu, TM Minea, A Anders, ... Journal of Physics D: Applied Physics 55 (1), 015202, 2022 | 24 | 2022 |
| On the electron energy distribution function in the high power impulse magnetron sputtering discharge M Rudolph, A Revel, D Lundin, H Hajihoseini, N Brenning, MA Raadu, ... Plasma Sources Science and Technology 30 (4), 045011, 2021 | 19 | 2021 |
| HiPIMS optimization by using mixed high-power and low-power pulsing N Brenning, H Hajihoseini, M Rudolph, MA Raadu, JT Gudmundsson, ... Plasma Sources Science and Technology 30 (1), 015015, 2021 | 19 | 2021 |
| On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering M Rudolph, H Hajihoseini, MA Raadu, JT Gudmundsson, N Brenning, ... Journal of Applied Physics 129 (3), 2021 | 19 | 2021 |
| The role of oxygen in magnetron-sputtered Ta3N5 thin films for the photoelectrolysis of water M Rudolph, D Stanescu, J Alvarez, E Foy, JP Kleider, H Magnan, T Minea, ... Surface and Coatings Technology 324, 620-625, 2017 | 17 | 2017 |
| Ionization region model of high power impulse magnetron sputtering of copper JT Gudmundsson, J Fischer, BP Hinriksson, M Rudolph, D Lundin Surface and Coatings Technology 442, 128189, 2022 | 16 | 2022 |
| Operating modes and target erosion in high power impulse magnetron sputtering M Rudolph, N Brenning, H Hajihoseini, MA Raadu, J Fischer, ... Journal of Vacuum Science & Technology A 40 (4), 2022 | 10 | 2022 |
| Modeling of high power impulse magnetron sputtering discharges with graphite target H Eliasson, M Rudolph, N Brenning, H Hajihoseini, M Zanáška, ... Plasma Sources Science and Technology 30 (11), 115017, 2021 | 10 | 2021 |
| Oxygen incorporated during deposition determines the crystallinity of magnetron-sputtered Ta3N5 films M Rudolph, I Vickridge, E Foy, J Alvarez, JP Kleider, D Stanescu, ... Thin Solid Films 685, 204-209, 2019 | 9 | 2019 |
| Target ion and neutral spread in high power impulse magnetron sputtering H Hajihoseini, N Brenning, M Rudolph, MA Raadu, D Lundin, J Fischer, ... Journal of Vacuum Science & Technology A 41 (1), 2023 | 8 | 2023 |
| Modeling of high power impulse magnetron sputtering discharges with tungsten target SS Babu, M Rudolph, D Lundin, T Shimizu, J Fischer, MA Raadu, ... Plasma Sources Science and Technology 31 (6), 065009, 2022 | 7 | 2022 |
| Improving the degree of crystallinity of magnetron-sputtered Ta3N5 thin films by augmenting the ion flux onto the substrate M Rudolph, A Demeter, E Foy, V Tiron, L Sirghi, T Minea, ... Thin Solid Films 636, 48-53, 2017 | 7 | 2017 |
| Electron transport in high power impulse magnetron sputtering at low and high working gas pressure M Rudolph, D Kalanov, W Diyatmika, A Anders Journal of Applied Physics 130 (24), 2021 | 6 | 2021 |
| Dynamics and 2D temperature distribution of plasma obtained by femtosecond laser-induced breakdown AM Hossain, M Ehrhardt, M Rudolph, D Kalanov, P Lorenz, K Zimmer, ... Journal of Physics D: Applied Physics 55 (12), 125204, 2021 | 6 | 2021 |
| UV-stable surface passivation for crystalline silicon cells in solar modules with UV light transmitting encapsulation materials R Witteck, P Jäger, M Rudolph, HP Sperlich, M König, G Köhler, ... 2019 IEEE 46th Photovoltaic Specialists Conference (PVSC), 2238-2242, 2019 | 5 | 2019 |
| Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges M Renner, J Fischer, H Hajihoseini, JT Gudmundsson, M Rudolph, ... Journal of Vacuum Science & Technology A 41 (3), 2023 | 4 | 2023 |
Jon Tomas GudmundssonUniversity of IcelandVerified email at hi.is
