Ravi Bonam
Ravi Bonam
Research Staff, IBM
Dirección de correo verificada de us.ibm.com
TítuloCitado porAño
Building a better methane generation model: Validating models with methane recovery rates from 35 Canadian landfills
S Thompson, J Sawyer, R Bonam, JE Valdivia
Waste management 29 (7), 2085-2091, 2009
1312009
Towards outperforming conventional sensor arrays with fabricated individual photonic vapour sensors inspired by Morpho butterflies
RA Potyrailo, RK Bonam, JG Hartley, TA Starkey, P Vukusic, M Vasudev, ...
Nature communications 6 (1), 1-12, 2015
1092015
Discovery of the surface polarity gradient on iridescent Morpho butterfly scales reveals a mechanism of their selective vapor response
RA Potyrailo, TA Starkey, P Vukusic, H Ghiradella, M Vasudev, T Bunning, ...
Proceedings of the National Academy of Sciences 110 (39), 15567-15572, 2013
762013
Wireless digital still image transmitter and control between computer or camera and television
W Hall
US Patent App. 10/141,188, 2003
382003
A functional verification based fault injection environment
A Benso, A Bosio, S Di Carlo, R Mariani
22nd IEEE International Symposium on Defect and Fault-Tolerance in VLSI …, 2007
292007
Performance characterization of negative resists for sub-10-nm electron beam lithography
R Bonam, P Verhagen, A Munder, J Hartley
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2010
172010
Clock-free nanowire crossbar architecture based on null convention logic (ncl)
R Bonam, S Chaudhary, Y Yellambalase, M Choi
2007 7th IEEE Conference on Nanotechnology (IEEE NANO), 85-89, 2007
162007
EUV mask and wafer defectivity: strategy and evaluation for full die defect inspection
R Bonam, HY Tien, A Chou, L Meli, S Halle, I Wu, X Huang, C Lei, C Kuan, ...
Extreme Ultraviolet (EUV) Lithography VII 9776, 97761C, 2016
132016
Modeling landfill gas generation to determine targets and strategies to reduce greenhouse gases from landfills
S Thompson, J Sawyer, RK Bonam, S Smith
Journal of Solid Waste Technology and Management 34 (1), 27, 2008
122008
Defect-tolerant gate macro mapping & placement in clock-free nanowire crossbar architecture
R Bonam, YB Kim, M Choi
22nd IEEE International Symposium on Defect and Fault-Tolerance in VLSI …, 2007
122007
EUV photomask defects: what prints, what doesn't, and what is required for HVM
J Rankin, ZJ Qi, M Lawliss, E Narita, K Seki, K Badger, R Bonam, S Halle, ...
Photomask Technology 2015 9635, 96350L, 2015
112015
Implementation of Static and Semi-Static Versions of a Bit-Wise Pipelined Dual-Rail NCL 2SComplement Multiplier
R Sankar, V Kadiyala, R Bonam, S Kumar, S Mohan, F Kacani, ...
2007 IEEE Region 5 Technical Conference, 228-233, 2007
112007
Operation and performance of the CNSE Vistec VB300 electron beam lithography system
JG Hartley, TR Groves, R Bonam, A Raghunathan, J Ruan, A McClelland, ...
Alternative Lithographic Technologies II 7637, 76371Y, 2010
102010
Characterization of e-beam patterned grating structures using Mueller matrix based scatterometry
GR Muthinti, BL Peterson, RK Bonam, AC Diebold
Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (1), 013018, 2013
92013
Printability and actinic AIMS review of programmed mask blank defects
E Verduijn, P Mangat, O Wood, J Rankin, Y Chen, F Goodwin, R Capelli, ...
Extreme Ultraviolet (EUV) Lithography VIII 10143, 101430K, 2017
82017
Printability of buried extreme ultraviolet lithography photomask defects
K Seki, T Isogawa, M Kagawa, S Akima, Y Kodera, KD Badger, ZJ Qi, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (2), 021004, 2016
82016
ENDEAVOUR to understand EUV buried defect printability
K Seki, T Isogawa, M Kagawa, S Akima, Y Kodera, K Badger, ZJ Qi, ...
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask …, 2015
82015
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
SD Halle, L Meli, R Delancey, K Vemareddy, G Crispo, R Bonam, ...
Extreme Ultraviolet (EUV) Lithography VI 9422, 94221D, 2015
82015
Defect detection strategies and process partitioning for SE EUV patterning
L Meli, K Petrillo, A De Silva, J Arnold, N Felix, C Robinson, B Briggs, ...
Extreme Ultraviolet (EUV) Lithography IX 10583, 105830E, 2018
62018
Recommendations for Improving the Canadian Methane Generation Model for Landfills
S Thompson, J Sawyer, R Bonam, S Smith
Report prepared for Environment Canada on Contract. University of Manitoba …, 2006
62006
El sistema no puede realizar la operación en estos momentos. Inténtalo de nuevo más tarde.
Artículos 1–20