Ravi Bonam
Ravi Bonam
Research Staff, IBM
Dirección de correo verificada de us.ibm.com
TítuloCitado porAño
Building a better methane generation model: Validating models with methane recovery rates from 35 Canadian landfills
S Thompson, J Sawyer, R Bonam, JE Valdivia
Waste management 29 (7), 2085-2091, 2009
Towards outperforming conventional sensor arrays with fabricated individual photonic vapour sensors inspired by Morpho butterflies
RA Potyrailo, RK Bonam, JG Hartley, TA Starkey, P Vukusic, M Vasudev, ...
Nature communications 6 (1), 1-12, 2015
Discovery of the surface polarity gradient on iridescent Morpho butterfly scales reveals a mechanism of their selective vapor response
RA Potyrailo, TA Starkey, P Vukusic, H Ghiradella, M Vasudev, T Bunning, ...
Proceedings of the National Academy of Sciences 110 (39), 15567-15572, 2013
Wireless digital still image transmitter and control between computer or camera and television
W Hall
US Patent App. 10/141,188, 2003
A functional verification based fault injection environment
A Benso, A Bosio, S Di Carlo, R Mariani
22nd IEEE International Symposium on Defect and Fault-Tolerance in VLSI …, 2007
Performance characterization of negative resists for sub-10-nm electron beam lithography
R Bonam, P Verhagen, A Munder, J Hartley
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2010
Clock-free nanowire crossbar architecture based on null convention logic (ncl)
R Bonam, S Chaudhary, Y Yellambalase, M Choi
2007 7th IEEE Conference on Nanotechnology (IEEE NANO), 85-89, 2007
EUV mask and wafer defectivity: strategy and evaluation for full die defect inspection
R Bonam, HY Tien, A Chou, L Meli, S Halle, I Wu, X Huang, C Lei, C Kuan, ...
Extreme Ultraviolet (EUV) Lithography VII 9776, 97761C, 2016
Modeling landfill gas generation to determine targets and strategies to reduce greenhouse gases from landfills
S Thompson, J Sawyer, RK Bonam, S Smith
Journal of Solid Waste Technology and Management 34 (1), 27, 2008
Defect-tolerant gate macro mapping & placement in clock-free nanowire crossbar architecture
R Bonam, YB Kim, M Choi
22nd IEEE International Symposium on Defect and Fault-Tolerance in VLSI …, 2007
EUV photomask defects: what prints, what doesn't, and what is required for HVM
J Rankin, ZJ Qi, M Lawliss, E Narita, K Seki, K Badger, R Bonam, S Halle, ...
Photomask Technology 2015 9635, 96350L, 2015
Implementation of Static and Semi-Static Versions of a Bit-Wise Pipelined Dual-Rail NCL 2SComplement Multiplier
R Sankar, V Kadiyala, R Bonam, S Kumar, S Mohan, F Kacani, ...
2007 IEEE Region 5 Technical Conference, 228-233, 2007
Operation and performance of the CNSE Vistec VB300 electron beam lithography system
JG Hartley, TR Groves, R Bonam, A Raghunathan, J Ruan, A McClelland, ...
Alternative Lithographic Technologies II 7637, 76371Y, 2010
Characterization of e-beam patterned grating structures using Mueller matrix based scatterometry
GR Muthinti, BL Peterson, RK Bonam, AC Diebold
Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (1), 013018, 2013
Printability and actinic AIMS review of programmed mask blank defects
E Verduijn, P Mangat, O Wood, J Rankin, Y Chen, F Goodwin, R Capelli, ...
Extreme Ultraviolet (EUV) Lithography VIII 10143, 101430K, 2017
Printability of buried extreme ultraviolet lithography photomask defects
K Seki, T Isogawa, M Kagawa, S Akima, Y Kodera, KD Badger, ZJ Qi, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (2), 021004, 2016
ENDEAVOUR to understand EUV buried defect printability
K Seki, T Isogawa, M Kagawa, S Akima, Y Kodera, K Badger, ZJ Qi, ...
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask …, 2015
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
SD Halle, L Meli, R Delancey, K Vemareddy, G Crispo, R Bonam, ...
Extreme Ultraviolet (EUV) Lithography VI 9422, 94221D, 2015
Defect detection strategies and process partitioning for SE EUV patterning
L Meli, K Petrillo, A De Silva, J Arnold, N Felix, C Robinson, B Briggs, ...
Extreme Ultraviolet (EUV) Lithography IX 10583, 105830E, 2018
Recommendations for Improving the Canadian Methane Generation Model for Landfills
S Thompson, J Sawyer, R Bonam, S Smith
Report prepared for Environment Canada on Contract. University of Manitoba …, 2006
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