André Anders - Citas de Google Académico

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Efim OksTomsk state university of control systems and radioelectronics (TUSUR)Dirección de correo verificada de fet.tusur.ru
Joakim AnderssonResearcher, Division of Solid State Electronics, Uppsala UniversityDirección de correo verificada de angstrom.uu.se
Prabir RoyLos Alamos National LaboratoryDirección de correo verificada de lanl.gov
Kin Man YuCity University of Hong KongDirección de correo verificada de cityu.edu.hk
Professor Jose Luis EndrinoBasque Center for Materials, Applications and NanostructuresDirección de correo verificada de bcmaterials.net
Charanjit Singh BhatiaNational University of SingaporeDirección de correo verificada de nus.edu.sg
Jochen M. SchneiderProfessor, Materials Chemistry, RWTH Aachen UniversityDirección de correo verificada de mch.rwth-aachen.de
Matthaeus LeitnerLawrence Berkeley National LaboratoryDirección de correo verificada de lbl.gov
Joel W. Ager IIIStaff Scientist, Lawrence Berkeley National Laboratory and Adjunct Professor, MSE, UC BerkeleyDirección de correo verificada de lbl.gov
david horwatFull Professor, Institut Jean Lamour, Université de LorraineDirección de correo verificada de univ-lorraine.fr
Kyriakos KOMVOPOULOSProfessor of Mechanical Engineering, University of California, BerkeleyDirección de correo verificada de me.berkeley.edu
Josh ColemanStaff Engineer/Scientist, LANLDirección de correo verificada de lanl.gov
Othon MonteiroBaker HughesDirección de correo verificada de materialsnanotech.com
P. A. SeidlLawrence Berkeley National LaboratoryDirección de correo verificada de lbl.gov
Ting TsuiUniversity of WaterlooDirección de correo verificada de uwaterloo.ca
George PharrProfessor of Materials Science, Texas A&M UniversityDirección de correo verificada de tamu.edu
Jochen ScheinProfessor, Universität der BundeswehrDirección de correo verificada de unibw.de
Johanna RosenProfessorDirección de correo verificada de liu.se
Robert FranzMontanuniversität Leoben, AustriaDirección de correo verificada de unileoben.ac.at
Nikolaev AlexeyInstitute of High Current Electronics, Tomsk, RussiaDirección de correo verificada de opee.hcei.tsc.ru

André Anders

Leibniz Institute of Surface Engineering (IOM)

Dirección de correo verificada de lbl.gov - Página principal

Plasma Physics Thin Films Material Science


Título	Citado por	Año
Cathodic Arcs: From Fractal Spots to Energetic Condensation A Anders Cathodic Arcs: From Fractal Spots to Energetic Condensation. New York …, 2008	626	2008
Handbook of plasma immersion ion implantation and deposition A Anders Wiley, 2000	582	2000
A structure zone diagram including plasma-based deposition and ion etching A Anders Thin Solid Films 518 (15), 4087-4090, 2010	525	2010
Dynamically modulating the surface plasmon resonance of doped semiconductor nanocrystals G Garcia, R Buonsanti, EL Runnerstrom, RJ Mendelsberg, A Llordes, ... Nano letters 11 (10), 4415-4420, 2011	414	2011
Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field A Anders, GY Yushkov Journal of Applied Physics 91 (8), 4824-4832, 2002	359	2002
Ion charge state distributions of vacuum arc plasmas: The origin of species A Anders Physical Review E 55 (1), 969, 1997	327	1997
Nanoindentation and nanoscratching of hard carbon coatings for magnetic disks TY Tsui, GM Pharr, WC Oliver, CS Bhatia, RL White, S Anders, A Anders, ... MRS Online Proceedings Library Archive 383, 1995	323	1995
High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering A Anders, J Andersson, A Ehiasarian Journal of Applied Physics 102 (11), 113303, 2007	288	2007
Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing GM Pharr, DL Callahan, SD McAdams, TY Tsui, S Anders, A Anders, ... Applied physics letters 68 (6), 779-781, 1996	287	1996
Metal plasma immersion ion implantation and deposition: a review A Anders Surface and Coatings Technology 93 (2-3), 158-167, 1997	286	1997
Approaches to rid cathodic arc plasmas of macro-and nanoparticles: a review A Anders Surface and Coatings Technology 120, 319-330, 1999	271	1999
Ion velocities in vacuum arc plasmas GY Yushkov, A Anders, EM Oks, IG Brown Journal of Applied Physics 88 (10), 5618-5622, 2000	239	2000
A discussion on the absence of plasma in spark plasma sintering DM Hulbert, A Anders, J Andersson, EJ Lavernia, AK Mukherjee Scripta Materialia 60 (10), 835-838, 2009	236	2009
Review of cathodic arc deposition technology at the start of the new millennium DM Sanders, A Anders Surface and Coatings Technology 133, 78-90, 2000	231	2000
Discharge physics of high power impulse magnetron sputtering A Anders Surface and Coatings Technology 205, S1-S9, 2011	202	2011
Ion charge state distributions in high current vacuum arc plasmas in a magnetic field EM Oks, A Anders, IG Brown, MR Dickinson, RA MacGill IEEE Transactions on Plasma Science 24 (3), 1174-1183, 1996	194	1996
Transport of vacuum arc plasmas through magnetic macroparticle filters A Anders, S Anders, IG Brown Plasma Sources Science and Technology 4 (1), 1, 1995	194	1995
The absence of plasma in “spark plasma sintering” DM Hulbert, A Anders, DV Dudina, J Andersson, D Jiang, C Unuvar, ... Journal of Applied Physics 104 (3), 033305, 2008	178	2008
Plasma-based ion implantation and deposition: A review of physics, technology, and applications J Pelletier, A Anders IEEE Transactions on Plasma Science 33 (6), 1944-1959, 2005	172	2005
Metal plasma immersion ion implantation and deposition using vacuum arc plasma sources A Anders, S Anders, IG Brown, MR Dickinson, RA MacGill Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994	171	1994

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