Andre Anders

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Efim OksTomsk state university of control systems and radioelectronics (TUSUR)Dirección de correo verificada de fet.tusur.ru
Joakim AnderssonResearcher, Division of Solid State Electronics, Uppsala UniversityDirección de correo verificada de angstrom.uu.se
Prabir RoyLos Alamos National LaboratoryDirección de correo verificada de lanl.gov
Professor Jose Luis EndrinoBasque Center for Materials, Applications and NanostructuresDirección de correo verificada de bcmaterials.net
Rueben J. MendelsbergFreeform FutureDirección de correo verificada de freeformfuture.com
Kin Man YuDepartment of Physics, City University of Hong KongDirección de correo verificada de cityu.edu.hk
Charanjit Singh BhatiaNational University of SingaporeDirección de correo verificada de nus.edu.sg
Jochen M. SchneiderProfessor, Materials Chemistry, RWTH Aachen UniversityDirección de correo verificada de mch.rwth-aachen.de
Joel W. Ager IIISenior Staff Scientist, Lawrence Berkeley Nat. Laboratory and Adjunct Professor, MSE, UC BerkeleyDirección de correo verificada de lbl.gov
Matthaeus LeitnerLawrence Berkeley National LaboratoryDirección de correo verificada de lbl.gov
david horwatFull Professor, Institut Jean Lamour, Université de LorraineDirección de correo verificada de univ-lorraine.fr
Robert FranzMontanuniversität Leoben, AustriaDirección de correo verificada de unileoben.ac.at
Kyriakos KOMVOPOULOSProfessor of Mechanical Engineering, University of California, BerkeleyDirección de correo verificada de me.berkeley.edu
Othon MonteiroBaker HughesDirección de correo verificada de materialsnanotech.com
P. A. SeidlLawrence Berkeley National LaboratoryDirección de correo verificada de lbl.gov
Jochen ScheinProfessor, Universität der BundeswehrDirección de correo verificada de unibw.de
Josh ColemanStaff Engineer/Scientist, LANLDirección de correo verificada de lanl.gov
Johanna RosenProfessorDirección de correo verificada de liu.se
George PharrProfessor of Materials Science, Texas A&M UniversityDirección de correo verificada de tamu.edu
Nikolaev AlexeyInstitute of High Current Electronics, Tomsk, RussiaDirección de correo verificada de opee.hcei.tsc.ru

Andre Anders

Leibniz Institute of Surface Engineering (IOM)

Dirección de correo verificada de iom-leipzig.de - Página principal

Plasma Physics Thin Films Material Science


Título Ordenar por citas Ordenar por año Ordenar por título	Citado por Citado por	Año
Cathodic Arcs: From Fractal Spots to Energetic Condensation A Anders Cathodic Arcs: From Fractal Spots to Energetic Condensation. New York …, 2008	779	2008
A structure zone diagram including plasma-based deposition and ion etching A Anders Thin Solid Films 518 (15), 4087-4090, 2010	685	2010
Handbook of plasma immersion ion implantation and deposition A Anders Wiley, 2000	656	2000
Dynamically modulating the surface plasmon resonance of doped semiconductor nanocrystals G Garcia, R Buonsanti, EL Runnerstrom, RJ Mendelsberg, A Llordes, ... Nano letters 11 (10), 4415-4420, 2011	498	2011
Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field A Anders, GY Yushkov Journal of Applied Physics 91 (8), 4824-4832, 2002	397	2002
Nanoindentation and nanoscratching of hard carbon coatings for magnetic disks TY Tsui, GM Pharr, WC Oliver, CS Bhatia, RL White, S Anders, A Anders, ... Oak Ridge National Lab., TN (United States); Oak Ridge Associated …, 1995	375	1995
Ion charge state distributions of vacuum arc plasmas: The origin of species A Anders Physical Review E 55 (1), 969, 1997	371	1997
High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering A Anders, J Andersson, A Ehiasarian Journal of applied physics 102 (11), 113303, 2007	329	2007
Metal plasma immersion ion implantation and deposition: a review A Anders Surface and Coatings Technology 93 (2-3), 158-167, 1997	312	1997
Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing GM Pharr, DL Callahan, SD McAdams, TY Tsui, S Anders, A Anders, ... Applied physics letters 68 (6), 779-781, 1996	301	1996
Approaches to rid cathodic arc plasmas of macro-and nanoparticles: a review A Anders Surface and Coatings Technology 120, 319-330, 1999	291	1999
Ion velocities in vacuum arc plasmas GY Yushkov, A Anders, EM Oks, IG Brown Journal of Applied Physics 88 (10), 5618-5622, 2000	269	2000
A discussion on the absence of plasma in spark plasma sintering DM Hulbert, A Anders, J Andersson, EJ Lavernia, AK Mukherjee Scripta Materialia 60 (10), 835-838, 2009	268	2009
Review of cathodic arc deposition technology at the start of the new millennium DM Sanders, A Anders Surface and Coatings Technology 133, 78-90, 2000	259	2000
Discharge physics of high power impulse magnetron sputtering A Anders Surface and Coatings Technology 205, S1-S9, 2011	254	2011
The absence of plasma in “spark plasma sintering” DM Hulbert, A Anders, DV Dudina, J Andersson, D Jiang, C Unuvar, ... Journal of Applied Physics 104 (3), 033305, 2008	216	2008
Ion charge state distributions in high current vacuum arc plasmas in a magnetic field EM Oks, A Anders, IG Brown, MR Dickinson, RA MacGill IEEE Transactions on Plasma Science 24 (3), 1174-1183, 1996	203	1996
Plasma-based ion implantation and deposition: A review of physics, technology, and applications J Pelletier, A Anders IEEE Transactions on Plasma Science 33 (6), 1944-1959, 2005	202	2005
Transport of vacuum arc plasmas through magnetic macroparticle filters A Anders, S Anders, IG Brown Plasma Sources Science and Technology 4 (1), 1, 1995	198	1995
Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS) A Anders Journal of Applied Physics 121 (17), 171101, 2017	189	2017

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