Jason Kenney
Jason Kenney
Verified email at amat.com
Title
Cited by
Cited by
Year
Electrochemical machining with ultrashort voltage pulses: modelling of charging dynamics and feature profile evolution
JA Kenney, GS Hwang
Nanotechnology 16 (7), S309, 2005
572005
Inductively coupled plasma source with symmetrical RF feed
JA Kenney, JD Carducci, KS Collins, R Fovell, K Ramaswamy, S Rauf
US Patent 9,928,987, 2018
532018
Two-dimensional computational model for electrochemical micromachining with ultrashort voltage pulses
JA Kenney, GS Hwang, W Shin
Applied physics letters 84 (19), 3774-3776, 2004
472004
Three-dimensional model of magnetized capacitively coupled plasmas
S Rauf, J Kenney, K Collins
Journal of Applied Physics 105 (10), 103301, 2009
262009
Etch trends in electrochemical machining with ultrashort voltage pulses: Predictions from theory and simulation
JA Kenney, GS Hwang
Electrochemical and Solid State Letters 9 (1), D1, 2005
262005
Etching with atomic precision by using low electron temperature plasma
L Dorf, JC Wang, S Rauf, GA Monroy, Y Zhang, A Agarwal, J Kenney, ...
Journal of Physics D: Applied Physics 50 (27), 274003, 2017
222017
Composite edge ring
O Joubert, JA Kenney, S Srinivasan, J Rogers, R Dhindsa, ...
US Patent App. 29/561,163, 2017
182017
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
L Dorf, S Rauf, J Liu, JA Kenney, A Nguyen, KS Collins, K Ramaswamy, ...
US Patent 9,111,722, 2015
182015
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
L Dorf, S Rauf, J Liu, JA Kenney, A Nguyen, KS Collins, K Ramaswamy, ...
US Patent 9,082,591, 2015
172015
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
L Dorf, S Rauf, J Liu, JA Kenney, A Nguyen, KS Collins, K Ramaswamy, ...
US Patent 9,082,591, 2015
172015
Prediction of stochastic behavior in differential charging of nanopatterned dielectric surfaces during plasma processing
JA Kenney, GS Hwang
Journal of applied physics 101 (4), 044307, 2007
152007
Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding
JA Kenney, JD Carducci, KS Collins, R Fovell, K Ramaswamy, S Rauf
US Patent 10,170,279, 2019
122019
Inductively coupled plasma source with multiple dielectric windows and window-supporting structure
A Nguyen, KS Collins, K Ramaswamy, S Rauf, JD Carducci, ...
US Patent 9,896,769, 2018
122018
Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates
JD Carducci, KS Collins, R Fovell, JA Kenney, K Ramaswamy, S Rauf
US Patent 9,082,590, 2015
122015
Influence of inhomogeneous magnetic field on the characteristics of very high frequency capacitively coupled plasmas
K Bera, S Rauf, J Kenney, L Dorf, K Collins
Journal of Applied Physics 107 (5), 053302, 2010
122010
Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding
JA Kenney, JD Carducci, KS Collins, R Fovell, K Ramaswamy, S Rauf
US Patent 10,249,470, 2019
112019
Symmetrical inductively coupled plasma source with symmetrical flow chamber
A Nguyen, KS Collins, K Ramaswamy, S Rauf, JD Carducci, ...
US Patent 9,745,663, 2017
92017
Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna
A Nguyen, K Ramaswamy, JA Kenney, S Rauf, KS Collins, Y Yang, ...
US Patent 9,449,794, 2016
92016
Effect of azimuthally asymmetric reactor components on a parallel plate capacitively coupled plasma
JA Kenney, S Rauf, K Collins
Journal of Applied Physics 106 (10), 103302, 2009
92009
Modeling of low pressure plasma sources for microelectronics fabrication
A Agarwal, K Bera, J Kenney, A Likhanskii, S Rauf
Journal of Physics D: Applied Physics 50 (42), 424001, 2017
82017
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Articles 1–20