| Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects PCW Ng, 3 Yen-Min, 4 Fu-Min, AC Chen Journal of Micro/Nanolithography, MEMS and MOEMS 10 (1), 013004-013004-13, 2011 | 40 | 2011 |
| Servo system design of a high-resolution piezo-driven fine stage for step-and-repeat microlithography systems KY Tsai, JY Yen IECON'99. Conference Proceedings. 25th Annual Conference of the IEEE …, 1999 | 31 | 1999 |
| Modeling the defect inspection sensitivity of a confocal microscope EM Gullikson, E Tejnil, KY Tsai, AR Stivers, H Kusunose Emerging Lithographic Technologies IX 5751, 1223-1229, 2005 | 19 | 2005 |
| Method for improving accuracy of parasitics extraction considering sub-wavelength lithography effects KY Tsai, WJ Hsieh, BS Chang US Patent 8,438,505, 2013 | 18 | 2013 |
| Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam–direct-write lithography CH Liu, PCW Ng, YT Shen, SW Chien, KY Tsai Journal of Vacuum Science & Technology B 31 (2), 2013 | 18 | 2013 |
| Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness PG Reddy, N Thakur, CL Lee, SW Chien, CP Pradeep, S Ghosh, KY Tsai, ... AIP Advances 7 (8), 2017 | 15 | 2017 |
| Architecture for next-generation massively parallel maskless lithography system (MPML2) MS Su, KY Tsai, YC Lu, YH Kuo, TH Pei, JY Yen Alternative Lithographic Technologies II 7637, 394-401, 2010 | 15 | 2010 |
| A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects KY Tsai, MF You, YC Lu, PCW Ng 2008 IEEE/ACM International Conference on Computer-Aided Design, 286-291, 2008 | 15 | 2008 |
| Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence YS Su, PCW Ng, KY Tsai, YY Chen Optical Microlithography XXI 6924, 1357-1365, 2008 | 15 | 2008 |
| DQIT:/spl mu/-synthesis without D-scale fitting KY Tsai, HA Hindi IEEE transactions on automatic control 49 (11), 2028-2032, 2004 | 14 | 2004 |
| Design of feedforward filters for improving tracking performances of existing feedback control systems KY Tsai, CD Schaper, T Kailath Proceedings of the 2002 American Control Conference (IEEE Cat. No. CH37301 …, 2002 | 14 | 2002 |
| Method for calibrating a manufacturing process model KY Tsai, ACH Chen, JH Li US Patent 9,541,500, 2017 | 11 | 2017 |
| New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography CH Liu, HT Ng, KY Tsai Journal of Micro/Nanolithography, MEMS, and MOEMS 11 (1), 013009-013009, 2012 | 11 | 2012 |
| Manufacturability Analysis of a Micro-Electro-Mechanical Systems–Based Electron-Optical System Design for Direct-Write Lithography SY Chen, SC Chen, HH Chen, KY Tsai, HH Pan Japanese Journal of Applied Physics 49 (6S), 06GE05, 2010 | 11 | 2010 |
| Impacts of optical proximity correction settings on electrical performances MF You, PCW Ng, YS Su, KY Tsai, YC Lu Design for Manufacturability through Design-Process Integration 6521, 287-293, 2007 | 11 | 2007 |
| Model-based proximity effect correction for electron-beam direct-write lithography CH Liu, PL Tien, PCW Ng, YT Shen, KY Tsai Alternative Lithographic Technologies II 7637, 430-437, 2010 | 10 | 2010 |
| A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography CH Liu, HT Ng, PCW Ng, KY Tsai, SJ Lin, JH Chen Lithography Asia 2008 7140, 367-376, 2008 | 10 | 2008 |
| Method for design of multi-objective robust controllers KY Tsai, H Hindi US Patent App. 10/709,458, 2004 | 10 | 2004 |
| Method for non-resist nanolithography MJ Chen, KY Tsai, CW Liu US Patent 9,972,702, 2018 | 9 | 2018 |
| Determining proximity effect parameters for non-rectangular semiconductor structures KY Tsai, MF You, YC Lu US Patent 9,087,173, 2015 | 9 | 2015 |
Haitham HindiPrincipal Research Scientist, Amazon.com, USADirección de correo verificada de amazon.com
