| Stable microcrystalline silicon thin-film transistors produced by the layer-by-layer technique P Roca i Cabarrocas, R Brenot, P Bulkin, R Vanderhaghen, B Drévillon, ... Journal of Applied Physics 86 (12), 7079-7082, 1999 | 100 | 1999 |
| Numerical modeling of capacitively coupled hydrogen plasmas: Effects of frequency and pressure T Novikova, B Kalache, P Bulkin, K Hassouni, W Morscheidt, ... Journal of applied physics 93 (6), 3198-3206, 2003 | 76 | 2003 |
| Plasma treatment of polycarbonate for improved adhesion A Hofrichter, P Bulkin, B Drévillon Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 20 (1 …, 2002 | 58 | 2002 |
| Metrology of replicated diffractive optics with Mueller polarimetry in conical diffraction T Novikova, A De Martino, P Bulkin, Q Nguyen, B Drévillon, V Popov, ... Optics Express 15 (5), 2033-2046, 2007 | 54 | 2007 |
| Properties and applications of electron cyclotron plasma deposited SiOxNy films with graded refractive index profiles PV Bulkin, PL Swart, BM Lacquet Journal of non-crystalline solids 187, 484-488, 1995 | 38 | 1995 |
| Deposition of SiO2 in integrated distributed electron cyclotron resonance microwave reactor P Bulkin, N Bertrand, B Drevillon Thin Solid Films 296 (1-2), 66-68, 1997 | 36 | 1997 |
| Electron cyclotron resonance plasma enhanced chemical vapour deposition and optical properties of SiOx thin films PV Bulkin, PL Swart, BM Lacquet Journal of non-crystalline solids 226 (1-2), 58-66, 1998 | 35 | 1998 |
| Rugate filter manufacturing by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiNx PL Swart, PV Bulkin, BM Lacquet Optical Engineering 36 (4), 1214-1220, 1997 | 34 | 1997 |
| Real time control of plasma deposited multilayers by multiwavelength ellipsometry M Kildemo, P Bulkin, S Deniau, B Drévillon Applied physics letters 68 (24), 3395-3397, 1996 | 29 | 1996 |
| Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma PRI Cabarrocas, P Bulkin, D Daineka, P Leempoel, P Descamps, ... US Patent 7,964,438, 2011 | 27 | 2011 |
| Two-dimensional photonic crystals by focused-ion-beam etching of multilayer membranes K Wang, P Filloux, N Paraire, P Roca i Cabarrocas, P Bulkin Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003 | 26 | 2003 |
| Real-time control by multiwavelength ellipsometry of plasma-deposited multilayers on glass by use of an incoherent-reflection model M Kildemo, P Bulkin, B Drévillon, O Hunderi Applied optics 36 (25), 6352-6359, 1997 | 26 | 1997 |
| Fourier-transform design and electron cyclotron resonance plasma-enhanced deposition of lossy graded-index optical coatings PV Bulkin, PL Swart, BM Lacquet Applied optics 35 (22), 4413-4419, 1996 | 26 | 1996 |
| High density plasma enhanced chemical vapor deposition of optical thin films D Daineka, P Bulkin, G Girard, JE Bourée, B Drévillon The European Physical Journal Applied Physics 26 (1), 3-9, 2004 | 25 | 2004 |
| Electron cyclotron resonance plasma deposition of SiNx for optical applications PV Bulkin, PL Swart, BM Lacquet Thin Solid Films 241 (1), 247-250, 1994 | 25 | 1994 |
| Plasma enhanced chemical vapour deposition of silica thin films in an integrated distributed electron cyclotron resonance reactor P Bulkin, N Bertrand, B Drévillon, JC Rostaing, F Delmotte, MC Hugon, ... Thin Solid Films 308, 63-67, 1997 | 24 | 1997 |
| Effect of process parameters on the properties of electron cyclotron resonance plasma deposited silicon-oxynitride PV Bulkin, PL Swart, BM Lacquet Journal of Non-Crystalline Solids 187, 403-408, 1995 | 21 | 1995 |
| Plasma enhanced chemical vapour deposition of SiOxNy in an integrated distributed electron cyclotron resonance reactor A Hofrichter, P Bulkin, B Drévillon Applied surface science 142 (1-4), 447-450, 1999 | 20 | 1999 |
| XPS investigation of the interaction between ECR-excited hydrogen and the native oxide of GaAs (100) GM Mikhailov, PV Bulkin, SA Khudobin, AA Chumakov, SY Shapoval Vacuum 43 (3), 199-201, 1992 | 20 | 1992 |
| Advances in the deposition of microcrystalline silicon at high rate by distributed electron cyclotron resonance PR i Cabarrocas, P Bulkin, D Daineka, TH Dao, P Leempoel, P Descamps, ... Thin Solid Films 516 (20), 6834-6838, 2008 | 19 | 2008 |
Pere Roca i CabarrocasLPICM, CNRS, Ecole Polytechnique, IPVFVerified email at polytechnique.edu
