| Reversible morphology control in block copolymer films via solvent vapor processing: an in situ GISAXS study MY Paik, JK Bosworth, DM Smilges, EL Schwartz, X Andre, CK Ober Macromolecules 43 (9), 4253-4260, 2010 | 200 | 2010 |
| Control of self-assembly of lithographically patternable block copolymer films JK Bosworth, MY Paik, R Ruiz, EL Schwartz, JQ Huang, AW Ko, ... Acs Nano 2 (7), 1396-1402, 2008 | 185 | 2008 |
| Control of self-assembly of lithographically patternable block copolymer films JK Bosworth, MY Paik, R Ruiz, EL Schwartz, JQ Huang, AW Ko, ... Acs Nano 2 (7), 1396-1402, 2008 | 185 | 2008 |
| Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution O Hellwig, JK Bosworth, E Dobisz, D Kercher, T Hauet, G Zeltzer, ... Applied Physics Letters 96 (5), 2010 | 160 | 2010 |
| Virus crystals as nanocomposite scaffolds JC Falkner, ME Turner, JK Bosworth, TJ Trentler, JE Johnson, T Lin, ... Journal of the American Chemical Society 127 (15), 5274-5275, 2005 | 129 | 2005 |
| Directed self-assembly of POSS containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor Y Tada, H Yoshida, Y Ishida, T Hirai, JK Bosworth, E Dobisz, R Ruiz, ... Macromolecules 45 (1), 292-304, 2012 | 106 | 2012 |
| Hydrothermal synthesis of quartz nanocrystals JF Bertone, J Cizeron, RK Wahi, JK Bosworth, VL Colvin Nano Letters 3 (5), 655-659, 2003 | 85 | 2003 |
| Effect of structural anisotropy on the coarsening kinetics of diblock copolymer striped patterns R Ruiz, JK Bosworth, CT Black Physical Review B 77 (5), 054204, 2008 | 83 | 2008 |
| Selective area control of self-assembled pattern architecture using a lithographically patternable block copolymer JK Bosworth, CT Black, CK Ober ACS nano 3 (7), 1761-1766, 2009 | 80 | 2009 |
| An efficient route to mesoporous silica films with perpendicular nanochannels S Nagarajan, M Li, RA Pai, JK Bosworth, P Busch, DM Smilgies, CK Ober, ... Advanced Materials 20 (2), 246-251, 2008 | 79 | 2008 |
| Supporting membranes on nanometer-scale self-assembled films JK Bosworth, EA Dobisz, R Ruiz, FDR dit Rose US Patent 8,206,601, 2012 | 31 | 2012 |
| Supporting membranes on nanometer-scale self-assembled films JK Bosworth, EA Dobisz, R Ruiz, FDR dit Rose US Patent 8,206,601, 2012 | 31 | 2012 |
| Simple fabrication of micropatterned mesoporous silica films using photoacid generators in block copolymers S Nagarajan, JK Bosworth, CK Ober, TP Russell, JJ Watkins Chemistry of materials 20 (3), 604-606, 2008 | 31 | 2008 |
| Three-dimensional mesoporous structures fabricated by independent stacking of self-assembled films on suspended membranes F Rose, JK Bosworth, EA Dobisz, R Ruiz Nanotechnology 22 (3), 035603, 2010 | 27 | 2010 |
| 20 nm pitch directed block copolymer assembly using solvent annealing for bit patterned media JK Bosworth, E Dobisz, R Ruiz Journal of Photopolymer Science and Technology 23 (2), 145-148, 2010 | 20 | 2010 |
| Impact of out-of-plane translational order in block copolymer lithography JK Bosworth, EA Dobisz, O Hellwig, R Ruiz Macromolecules 44 (23), 9196-9204, 2011 | 15 | 2011 |
| Control of morphology orientation in lithographically patternable diblock copolymers JK Bosworth, X Andre, EL Schwartz, R Ruiz, CT Black, CK Ober Journal of Photopolymer Science and Technology 20 (4), 519-522, 2007 | 6 | 2007 |
| Top-Down versus Bottom-Up Patterning of Polymers JK Bosworth, CK Ober Elsevier, 2012 | 5 | 2012 |
| ACS Nano 2008, 2, 1396–1402 [ACS Full Text ACS Full Text] JK Bosworth, MY Paik, R Ruiz, EL Schwartz, JQ Huang, AW Ko, ... Google Scholar There is no corresponding record for this reference, 0 | 3 | |
| New self-assembly strategies for next-generation lithography EL Schwartz, JK Bosworth, MY Paik, CK Ober Advances in Resist Materials and Processing Technology XXVII 7639, 138-148, 2010 | 2 | 2010 |
