Stephen D. Hsu
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Contact hole reticle optimization by using interference mapping lithography (IML)
RJ Socha, DJ Van Den Broeke, SD Hsu, JF Chen, TL Laidig, N Corcoran, ...
Optical Microlithography XVII 5377, 222-240, 2004
An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging
S Hsu, L Chen, Z Li, S Park, K Gronlund, H Liu, N Callan, R Socha, ...
Lithography Asia 2008 7140, 220-229, 2008
EUV resolution enhancement techniques (RETs) for k1 0.4 and below
S Hsu, R Howell, J Jia, HY Liu, K Gronlund, S Hansen, J Zimmermann
Extreme Ultraviolet (EUV) Lithography VI 9422, 480-495, 2015
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
D Van Den Broeke, JF Chen, T Laidig, KE Wampler, SD Hsu
US Patent 7,247,574, 2007
High NA EUV lithography: Next step in EUV imaging
E van Setten, G Bottiglieri, J McNamara, J van Schoot, K Troost, J Zekry, ...
Extreme Ultraviolet (EUV) Lithography X 10957, 9-18, 2019
Application challenges with double patterning technology (DPT) beyond 45 nm
J Park, S Hsu, D Van Den Broeke, JF Chen, M Dusa, R Socha, J Finders, ...
Photomask Technology 2006 6349, 611-622, 2006
EUV source-mask optimization for 7nm node and beyond
X Liu, R Howell, S Hsu, K Yang, K Gronlund, F Driessen, HY Liu, ...
Extreme Ultraviolet (EUV) Lithography V 9048, 171-181, 2014
Understanding the forbidden pitch phenomenon and assist feature placement
X Shi, S Hsu, JF Chen, CM Hsu, RJ Socha, MV Dusa
Metrology, Inspection, and Process Control for Microlithography XVI 4689 …, 2002
Orientation dependent shielding for use with dipole illumination techniques
SD Hsu, N Corcoran, JF Chen
US Patent 7,246,342, 2007
Double patterning lithography: The bridge between low k (1) ArF and EUV
J Finders, M Dusa, S Hsu
Microlithography World 17 (1), 2-+, 2008
Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
S Hsu, NP Corcoran, M Eurlings, WT Knose, TL Laidig, KE Wampler, ...
Optical Microlithography XV 4691, 476-490, 2002
Freeform illumination sources: an experimental study of source-mask optimization for 22-nm SRAM cells
J Bekaert, B Laenens, S Verhaegen, L Van Look, D Trivkovic, F Lazzarino, ...
Optical Microlithography XXIII 7640, 79-90, 2010
Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems
M Mulder, A Engelen, O Noordman, R Kazinczi, G Streutker, ...
Lithography Asia 2009 7520, 308-316, 2009
Development of layout split algorithms and printability evaluation for double patterning technology
TB Chiou, R Socha, H Chen, L Chen, S Hsu, P Nikolsky, A van Oosten, ...
Optical Microlithography XXI 6924, 1216-1225, 2008
Double exposure technique for 45nm node and beyond
S Hsu, J Park, D Van Den Broeke, JF Chen
25th Annual BACUS Symposium on Photomask Technology 5992, 557-572, 2005
Source-mask co-optimization: optimize design for imaging and impact of source complexity on lithography performance
S Hsu, Z Li, L Chen, K Gronlund, H Liu, R Socha
Lithography Asia 2009 7520, 101-111, 2009
Complex 2D pattern lithography at lambda/4 resolution using chromeless phase lithography (CPL)
DJ Van Den Broeke, JF Chen, TL Laidig, S Hsu, KE Wampler, RJ Socha, ...
Optical Microlithography XV 4691, 196-214, 2002
Method and apparatus for performing rule-based gate shrink utilizing dipole illumination
SD Hsu, N Corcoran, JF Chen
US Patent 6,915,505, 2005
65-nm full-chip implementation using double dipole lithography
SD Hsu, JF Chen, N Cororan, WT Knose, DJ Van Den Broeke, TL Laidig, ...
Optical Microlithography XVI 5040, 215-231, 2003
Method and apparatus for minimizing optical proximity effects
X Shi, JF Chen, S Hsu
US Patent 6,519,760, 2003
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