Three-Nucleon Charge Radius: A Precise Laser Determination Using He D Shiner, R Dixson, V Vedantham
Physical review letters 74 (18), 3553, 1995
142 1995 Determination of optimal parameters for CD-SEM measurement of line-edge roughness BD Bunday, M Bishop, DW McCormack Jr, JS Villarrubia, AE Vladar, ...
Metrology, Inspection, and Process Control for Microlithography XVIII 5375 …, 2004
115 2004 Precise measurement of the Lamb shift and fine structure of the 2S -2P transition in triplet helium D Shiner, R Dixson, P Zhao
Physical review letters 72 (12), 1802, 1994
115 1994 Traceable calibration of critical-dimension atomic force microscope linewidth measurements with nanometer uncertainty RG Dixson, RA Allen, WF Guthrie, MW Cresswell
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005
106 2005 Scanning probe microscope dimensional metrology at NIST JA Kramar, R Dixson, NG Orji
Measurement science and technology 22 (2), 024001, 2010
78 2010 Higher order tip effects in traceable CD-AFM-based linewidth measurements NG Orji, RG Dixson
Measurement Science and Technology 18 (2), 448, 2007
70 2007 Accurate dimensional metrology with atomic force microscopy RG Dixson, RGJ Koening, J Fu, TV Vorburger, BT Renegar
Metrology, Inspection, and Process Control for Microlithography XIV 3998 …, 2000
66 2000 Progress on implementation of a reference measurement system based on a critical-dimension atomic force microscope NG Orji, RG Dixson, A Martinez, BD Bunday, JA Allgair, TV Vorburger
Journal of Micro/Nanolithography, MEMS and MOEMS 6 (2), 023002-023002-10, 2007
63 2007 CD-AFM reference metrology at NIST and SEMATECH R Dixson, J Fu, N Orji, W Guthrie, R Allen, M Cresswell
Metrology, Inspection, and Process Control for Microlithography XIX 5752 …, 2005
60 2005 Line edge roughness metrology using atomic force microscopes NG Orji, TV Vorburger, J Fu, RG Dixson, CV Nguyen, J Raja
Measurement Science and Technology 16 (11), 2147, 2005
59 2005 RM 8111: Development of a prototype linewidth standard MW Cresswell, WF Guthrie, RG Dixson, RA Allen, CE Murabito, ...
Journal of Research of the National Institute of Standards and Technology …, 2006
58 2006 Conformal oxides on Si surfaces V Tsai, XS Wang, ED Williams, J Schneir, R Dixson
Applied physics letters 71 (11), 1495-1497, 1997
56 1997 Reference metrology using a next-generation CD-AFM R Dixson, A Guerry
Metrology, Inspection, and Process Control for Microlithography XVIII 5375 …, 2004
51 2004 Improving optical measurement accuracy using multi-technique nested uncertainties RM Silver, NF Zhang, BM Barnes, H Zhou, A Heckert, R Dixson, ...
Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009
50 2009 Dimensional metrology with the NIST calibrated atomic force microscope RG Dixson, RGJ Koening, VWC Tsai, J Fu, TV Vorburger
Metrology, Inspection, and Process Control for Microlithography XIII 3677, 20-34, 1999
48 1999 Dimensional metrology with the NIST calibrated atomic force microscope RG Dixson, RGJ Koening, VWC Tsai, J Fu, TV Vorburger
Metrology, Inspection, and Process Control for Microlithography XIII 3677, 20-34, 1999
48 1999 Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization J Qin, RM Silver, BM Barnes, H Zhou, RG Dixson, MA Henn
Light: Science & Applications 5 (2), e16038-e16038, 2016
47 2016 TSOM method for semiconductor metrology R Attota, RG Dixson, JA Kramar, JE Potzick, AE Vladár, B Bunday, ...
Metrology, Inspection, and Process Control for Microlithography XXV 7971 …, 2011
47 2011 Intercomparison of SEM, AFM, and electrical linewidths JS Villarrubia, RG Dixson, SN Jones, JR Lowney, MT Postek Jr, RA Allen, ...
Metrology, Inspection, and Process Control for Microlithography XIII 3677 …, 1999
46 1999 Comparison of line width calibration using critical dimension atomic force microscopes between PTB and NIST G Dai, K Hahm, H Bosse, RG Dixson
Measurement Science and Technology 28 (6), 065010, 2017
43 2017