| Clusters of defects as a possible origin of random telegraph signal in imager devices: a dft based study A Jay, A Hémeryck, F Cristiano, D Rideau, PL Julliard, V Goiffon, ... 2021 International Conference on Simulation of Semiconductor Processes and …, 2021 | 6 | 2021 |
| Low temperature carbon co-implantation in silicon: Defects suppression and diffusion modeling P Dumas, PL Julliard, J Borrel, S Duguay, F Hilario, F Deprat, V Lu, ... Journal of Applied Physics 129 (19), 2021 | 2 | 2021 |
| Multi-scale simulations investigation of defects in semiconductor devices PL Julliard Université Paul Sabatier-Toulouse III, 2023 | | 2023 |
| Prediction of the evolution of defects induced by the heated implantation process: Contribution of kinetic Monte Carlo in a multi-scale modeling framework PL Julliard, A Johnsson, N Zographos, R Demoulin, R Monflier, A Jay, ... Solid-State Electronics 200, 108521, 2023 | | 2023 |
| Kinetic Monte Carlo for Process Simulation: First Principles Calibrated Parameters for BO2 PL Julliard, A Jay, M Gunde, N Salles, F Monsieur, N Guitard, T Cabout, ... 2021 International Conference on Simulation of Semiconductor Processes and …, 2021 | | 2021 |
| Implant heating contribution to amorphous layer formation: a KMC approach PL Julliard, P Dumas, F Monsieur, F Hilario, D Rideau, A Hémeryck, ... 2020 International Conference on Simulation of Semiconductor Processes and …, 2020 | | 2020 |
| D2. 1: First batch of experimental results on heated implants and SPER PL Julliard, R Monflier, R Demoulin, RPD STM, FM STM, FH STM, SJ STM, ... | | |
| 1ST Microelectronics, Crolles, France 2LAAS-CNRS, Université de Toulouse, CNRS, Toulouse, France Email: pierre-louis. julliard@ st. com PL Julliard, P Dumas, F Monsieur, F Hilario, D Rideau, A Hemeryck, ... | | |
