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Kaichen Zhu
Kaichen Zhu
Verified email at kaust.edu.sa - Homepage
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Cited by
Cited by
Year
Recommended methods to study resistive switching devices
M Lanza, HSP Wong, E Pop, D Ielmini, D Strukov, BC Regan, L Larcher, ...
Advanced Electronic Materials 5 (1), 1800143, 2019
5752019
The development of integrated circuits based on two-dimensional materials
K Zhu, C Wen, AA Aljarb, F Xue, X Xu, V Tung, X Zhang, HN Alshareef, ...
Nature Electronics 4 (11), 775-785, 2021
1602021
Standards for the characterization of endurance in resistive switching devices
M Lanza, R Waser, D Ielmini, JJ Yang, L Goux, J Suñe, AJ Kenyon, ...
ACS nano 15 (11), 17214-17231, 2021
1482021
28.2%-efficient, outdoor-stable perovskite/silicon tandem solar cell
J Liu, E Aydin, J Yin, M De Bastiani, FH Isikgor, AU Rehman, E Yengel, ...
Joule 5 (12), 3169-3186, 2021
1112021
Hybrid 2D–CMOS microchips for memristive applications
K Zhu, S Pazos, F Aguirre, Y Shen, Y Yuan, W Zheng, O Alharbi, ...
Nature 618 (7963), 57-62, 2023
782023
Advanced Data Encryption​ using 2D Materials
C Wen, X Li, T Zanotti, FM Puglisi, Y Shi, F Saiz, A Antidormi, S Roche, ...
Advanced Materials 33 (27), 2100185, 2021
772021
Graphene–boron nitride–graphene cross-point memristors with three stable resistive states
K Zhu, X Liang, B Yuan, MA Villena, C Wen, T Wang, S Chen, F Hui, Y Shi, ...
ACS applied materials & interfaces 11 (41), 37999-38005, 2019
682019
Variability and Yield in h‐BN‐Based Memristive Circuits: The Role of Each Type of Defect
Y Shen, W Zheng, K Zhu, Y Xiao, C Wen, Y Liu, X Jing, M Lanza
Advanced Materials 33 (41), 2103656, 2021
642021
Synthesis of large-area multilayer hexagonal boron nitride sheets on iron substrates and its use in resistive switching devices
F Hui, MA Villena, W Fang, AY Lu, J Kong, Y Shi, X Jing, K Zhu, M Lanza
2D Materials 5 (3), 031011, 2018
562018
Hybrid architecture based on two-dimensional memristor crossbar array and CMOS integrated circuit for edge computing
P Kumar, K Zhu, X Gao, SD Wang, M Lanza, CS Thakur
npj 2D Materials and Applications 6 (1), 8, 2022
332022
Random Telegraph Noise in Metal‐Oxide Memristors for True Random Number Generators: A Materials Study
X Li, T Zanotti, T Wang, K Zhu, FM Puglisi, M Lanza
Advanced Functional Materials 31 (27), 2102172, 2021
302021
Defect‐Free Metal Deposition on 2D Materials via Inkjet Printing Technology
W Zheng, F Saiz, Y Shen, K Zhu, Y Liu, C McAleese, B Conran, X Wang, ...
Advanced Materials 34 (48), 2104138, 2022
282022
Advanced data encryption using two-dimensional materials
M Lanza, C Wen, X Li, T Zanotti, FM Puglisi, Y Shi, F Saiz, A Antidormi, ...
Adv. Mater 33 (2100185.10), 1002, 2021
252021
Electroforming in metal-oxide memristive synapses
T Wang, Y Shi, FM Puglisi, S Chen, K Zhu, Y Zuo, X Li, X Jing, T Han, ...
ACS applied materials & interfaces 12 (10), 11806-11814, 2020
242020
Variability of metal/h-BN/metal memristors grown via chemical vapor deposition on different materials
MA Villena, F Hui, X Liang, Y Shi, B Yuan, X Jing, K Zhu, S Chen, ...
Microelectronics Reliability 102, 113410, 2019
212019
Memristors with Initial Low‐Resistive State for Efficient Neuromorphic Systems
K Zhu, MR Mahmoodi, Z Fahimi, Y Xiao, T Wang, K Bukvišová, M Kolíbal, ...
Advanced Intelligent Systems 4 (8), 2200001, 2022
132022
Effect of the pressure exerted by probe station tips in the electrical characteristics of memristors
Y Zuo, H Lin, J Guo, Y Yuan, H He, Y Li, Y Xiao, X Li, K Zhu, T Wang, ...
Advanced Electronic Materials 6 (3), 1901226, 2020
122020
Experimental observation and mitigation of dielectric screening in hexagonal boron nitride based resistive switching devices
B Wang, N Xiao, C Pan, Y Shi, F Hui, X Jing, K Zhu, B Guo, MA Villena, ...
Crystal Research and Technology 53 (4), 1800006, 2018
122018
High‐Temporal‐Resolution Characterization Reveals Outstanding Random Telegraph Noise and the Origin of Dielectric Breakdown in h‐BN Memristors
S Pazos, T Becker, MA Villena, W Zheng, Y Shen, Y Yuan, O Alharbi, ...
Advanced Functional Materials 34 (15), 2213816, 2024
102024
On the limits of scanning thermal microscopy of ultrathin films
C Metzke, W Frammelsberger, J Weber, F Kühnel, K Zhu, M Lanza, ...
Materials 13 (3), 518, 2020
102020
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Articles 1–20