Follow
Iván Santos Tejido || ORCID: 0000-0003-1388-4346
Iván Santos Tejido || ORCID: 0000-0003-1388-4346
Verified email at uva.es - Homepage
Title
Cited by
Cited by
Year
Modeling of damage generation mechanisms in silicon at energies below the displacement threshold
I Santos, LA Marqués, L Pelaz
Physical Review B 74 (17), 174115, 2006
602006
Front-end process modeling in silicon
L Pelaz, LA Marqués, M Aboy, P López, I Santos
The European Physical Journal B 72 (3), 323-359, 2009
452009
Characterization of octadecaborane implantation into Si using molecular dynamics
LA Marqués, L Pelaz, I Santos, VC Venezia
Physical Review B 74 (20), 201201, 2006
362006
Molecular dynamics simulations of damage production by thermal spikes in Ge
P López, L Pelaz, I Santos, LA Marqués, M Aboy
Journal of Applied Physics 111 (3), 033519, 2012
322012
Modeling of defects, dopant diffusion and clustering in silicon
M Aboy, I Santos, L Pelaz, LA Marqués, P López
Journal of Computational Electronics 13 (1), 40-58, 2014
302014
Improved atomistic damage generation model for binary collision simulations
I Santos, LA Marqués, L Pelaz, P López
Journal of Applied Physics 105 (8), 083530, 2009
302009
Recrystallization of atomically balanced amorphous pockets in Si: A source of point defects
LA Marqués, L Pelaz, P López, I Santos, M Aboy
Physical Review B 76 (15), 153201, 2007
282007
Atomistic modeling of impurity ion implantation in ultra-thin-body Si devices
L Pelaz, R Duffy, M Aboy, L Marques, P Lopez, I Santos, BJ Pawlak, ...
2008 IEEE International Electron Devices Meeting, 1-4, 2008
262008
Atomistic analysis of the annealing behavior of amorphous regions in silicon
P López, L Pelaz, LA Marqués, I Santos
Journal of applied physics 101 (9), 093518, 2007
242007
Elucidating the atomistic mechanisms driving self-diffusion of amorphous Si during annealing
I Santos, LA Marqués, L Pelaz, L Colombo
Physical Review B 83 (15), 153201, 2011
222011
Molecular dynamics characterization of as-implanted damage in silicon
I Santos, LA Marqués, L Pelaz, P López, M Aboy, J Barbolla
Materials Science and Engineering: B 124, 372-375, 2005
222005
Insights on the atomistic origin of X and W photoluminescence lines in c-Si from ab initio simulations
I Santos, M Aboy, P López, LA Marqués, L Pelaz
Journal of Physics D: Applied Physics 49 (7), 075109, 2016
202016
Molecular dynamics simulation of the regrowth of nanometric multigate Si devices
LA Marqués, L Pelaz, I Santos, P López, R Duffy
Journal of Applied Physics 111 (3), 034302, 2012
202012
Self-trapping in B-doped amorphous Si: Intrinsic origin of low acceptor efficiency
I Santos, P Castrillo, W Windl, DA Drabold, L Pelaz, LA Marqués
Physical Review B 81 (3), 033203, 2010
182010
Structural transformations from point to extended defects in silicon: A molecular dynamics study
LA Marqués, L Pelaz, I Santos, P López, M Aboy
Physical Review B 78 (19), 193201, 2008
172008
W and X photoluminescence centers in crystalline Si: chasing candidates at atomic level through multiscale simulations
M Aboy, I Santos, P López, LA Marqués, L Pelaz
Journal of Electronic Materials 47 (9), 5045-5049, 2018
142018
Molecular dynamics simulation of the early stages of self-interstitial clustering in silicon
LA Marqués, M Aboy, M Ruiz, I Santos, P López, L Pelaz
Materials Science in Semiconductor Processing 42, 235-238, 2016
142016
Molecular dynamics study of damage generation mechanisms in silicon at the low energy regime
I Santos, LA Marques, L Pelaz, P Lopez
2007 Spanish Conference on Electron Devices, 37-40, 2007
132007
Atomistic study of the structural and electronic properties of a-Si: H/c-Si interfaces
I Santos, M Cazzaniga, G Onida, L Colombo
Journal of Physics: Condensed Matter 26 (9), 095001, 2014
122014
Atomistic process modeling based on Kinetic Monte Carlo and Molecular Dynamics for optimization of advanced devices
L Pelaz, L Marques, M Aboy, P Lopez, I Santos, R Duffy
2009 IEEE International Electron Devices Meeting (IEDM), 1-4, 2009
122009
The system can't perform the operation now. Try again later.
Articles 1–20