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Arancha I. Dago
Arancha I. Dago
Instituto de Ciencia de Materiales de Madrid, CSIC
Verified email at csic.es
Title
Cited by
Cited by
Year
Sub-20 nm patterning of thin layer WSe2 by scanning probe lithography
AI Dago, YK Ryu, R Garcia
Applied Physics Letters 109 (16), 2016
552016
Direct Patterning of p-Type-Doped Few-layer WSe2 Nanoelectronic Devices by Oxidation Scanning Probe Lithography
AI Dago, YK Ryu, FJ Palomares, R Garcia
ACS applied materials & interfaces 10 (46), 40054-40061, 2018
322018
Chemical and structural analysis of sub-20 nm graphene patterns generated by scanning probe lithography
AI Dago, S Sangiao, R Fernández-Pacheco, JM De Teresa, R Garcia
Carbon 129, 281-285, 2018
222018
Sub-10 nm patterning of few-layer MoS2 and MoSe2 nanolectronic devices by oxidation scanning probe lithography
YK Ryu, AI Dago, Y He, FM Espinosa, E López-Elvira, C Munuera, ...
Applied Surface Science 539, 148231, 2021
162021
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