Shahid Rauf
Title
Cited by
Cited by
Year
The 2012 plasma roadmap
S Samukawa, M Hori, S Rauf, K Tachibana, P Bruggeman, G Kroesen, ...
Journal of Physics D: Applied Physics 45 (25), 253001, 2012
5972012
The 2017 Plasma Roadmap: Low temperature plasma science and technology
I Adamovich, SD Baalrud, A Bogaerts, PJ Bruggeman, M Cappelli, ...
Journal of Physics D: Applied Physics 50 (32), 323001, 2017
5282017
Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation
S Rauf, MJ Kushner
Journal of applied physics 85 (7), 3460-3469, 1999
2851999
Dual mode inductively coupled plasma reactor with adjustable phase coil assembly
S Banna, VN Todorow, KS Collins, A Nguyen, MJ Salinas, Z Chen, ...
US Patent App. 12/821,636, 2011
2562011
Plasma reactor gas distribution plate with radially distributed path splitting manifold
K Bera, S Rauf
US Patent 8,512,509, 2013
2002013
Argon metastable densities in radio frequency Ar, and electrical discharges
S Rauf, MJ Kushner
Journal of applied physics 82 (6), 2805-2813, 1997
1981997
Etch method in the manufacture of an integrated circuit
TG Sparks, R Shahid
US Patent App. 12/377,348, 2011
1972011
Independent control of RF phases of separate coils of an inductively coupled plasma reactor
KS Collins, S Kobayashi, L Wong, J Liu, Y Yang, K Ramaswamy, S Rauf
US Patent 9,161,428, 2015
1942015
Two-phase operation of plasma chamber by phase locked loop
S Kobayashi, L Wong, J Liu, Y Yang, K Ramaswamy, S Rauf, SC Nevil, ...
US Patent App. 13/632,302, 2013
1702013
Feol low-k spacers
KS Collins, K Ramaswamy, Y Zhang, H Chang, L Dorf, MF Wu, S Rauf
US Patent App. 14/323,855, 2016
1432016
Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources
S Rauf, MJ Kushner
IEEE Transactions on Plasma Science 27 (5), 1329-1338, 1999
1411999
Pulsed plasma high aspect ratio dielectric process
A Agarwal, KS Collins, S Rauf, K Ramaswamy, TB Lill
US Patent 8,382,999, 2013
1052013
Inductively coupled pulsed plasmas in the presence of synchronous pulsed substrate bias for robust, reliable, and fine conductor etching
S Banna, A Agarwal, K Tokashiki, H Cho, S Rauf, V Todorow, ...
IEEE Transactions on Plasma Science 37 (9), 1730-1746, 2009
1002009
Synchronized radio frequency pulsing for plasma etching
B Liao, K Kawasaki, Y Pattar, SF Shoji, DD Nguyen, K Ramaswamy, ...
US Patent 8,962,488, 2015
962015
Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution
K Bera, S Rauf
US Patent App. 12/004,448, 2009
932009
Breakdown processes in metal halide lamps
B Lay, RS Moss, S Rauf, MJ Kushner
Plasma sources science and technology 12 (1), 8, 2002
842002
Dynamics of a coplanar-electrode plasma display panel. II. Cell optimization
S Rauf, MJ Kushner
Journal of applied physics 85 (7), 3470-3476, 1999
821999
Synchronized radio frequency pulsing for plasma etching
B Liao, K Kawasaki, Y Pattar, SF Shoji, DD Nguyen, K Ramaswamy, ...
US Patent 8,404,598, 2013
812013
Self-consistent simulation of very high frequency capacitively coupled plasmas
S Rauf, K Bera, K Collins
Plasma Sources Science and Technology 17 (3), 035003, 2008
742008
Self-consistent simulation of very high frequency capacitively coupled plasmas
S Rauf, K Bera, K Collins
Plasma Sources Science and Technology 17 (3), 035003, 2008
742008
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