| Temperature-dependent ambipolar charge carrier mobility in large-crystal hybrid halide perovskite thin films A Biewald, N Giesbrecht, T Bein, P Docampo, A Hartschuh, R Ciesielski ACS applied materials & interfaces 11 (23), 20838-20844, 2019 | 64 | 2019 |
| Raman radiation patterns of graphene H Budde, N Coca-López, X Shi, R Ciesielski, A Lombardo, D Yoon, ... ACS nano 10 (2), 1756-1763, 2016 | 62 | 2016 |
| Radiation channels close to a plasmonic nanowire visualized by back focal plane imaging N Hartmann, D Piatkowski, R Ciesielski, S Mackowski, A Hartschuh ACS nano 7 (11), 10257-10262, 2013 | 60 | 2013 |
| Grain boundaries act as solid walls for charge carrier diffusion in large crystal MAPI thin films R Ciesielski, F Schäfer, NF Hartmann, N Giesbrecht, T Bein, P Docampo, ... ACS applied materials & interfaces 10 (9), 7974-7981, 2018 | 56 | 2018 |
| Graphene near-degenerate four-wave mixing for phase characterization of broadband pulses in ultrafast microscopy R Ciesielski, A Comin, M Handloser, K Donkers, G Piredda, A Lombardo, ... Nano letters 15 (8), 4968-4972, 2015 | 34 | 2015 |
| Microscopic view on the ultrafast photoluminescence from photoexcited graphene T Winzer, R Ciesielski, M Handloser, A Comin, A Hartschuh, E Malic Nano letters 15 (2), 1141-1145, 2015 | 28 | 2015 |
| Compression of ultrashort laser pulses via gated multiphoton intrapulse interference phase scans A Comin, R Ciesielski, G Piredda, K Donkers, A Hartschuh JOSA B 31 (5), 1118-1125, 2014 | 25 | 2014 |
| Determination of optical constants of thin films in the EUV R Ciesielski, Q Saadeh, V Philipsen, K Opsomer, JP Soulié, M Wu, ... Applied Optics 61 (8), 2060-2078, 2022 | 22 | 2022 |
| Vibrational spectroscopy and morphological studies on protein-capped biosynthesized silver nanoparticles EVH Agressott, D Blätte, FA Cunha, VT Noronha, R Ciesielski, ... ACS omega 5 (1), 386-393, 2020 | 17 | 2020 |
| Phase retrieval of ultrashort laser pulses using a MIIPS algorithm A Comin, R Ciesielski, N Coca-López, A Hartschuh Optics Express 24 (3), 2505-2512, 2016 | 13 | 2016 |
| Non-linear Raman scattering intensities in graphene V Giegold, L Lange, R Ciesielski, A Hartschuh Nanoscale 12 (9), 5612-5617, 2020 | 9 | 2020 |
| Nanoscale grating characterization using EUV scatterometry and soft x-ray scattering with plasma and synchrotron radiation LM Lohr, R Ciesielski, S Glabisch, S Schröder, S Brose, V Soltwisch Applied Optics 62 (1), 117-132, 2023 | 8 | 2023 |
| Tailored Local Bandgap Modulation as a Strategy to Maximize Luminescence Yields in Mixed‐Halide Perovskites S Feldmann, T Neumann, R Ciesielski, RH Friend, A Hartschuh, ... Advanced optical materials 9 (18), 2100635, 2021 | 7 | 2021 |
| Controlling photon antibunching from 1D emitters using optical antennas L Lange, F Schäfer, A Biewald, R Ciesielski, A Hartschuh Nanoscale 11 (31), 14907-14911, 2019 | 5 | 2019 |
| Pulse characterization in ultrafast microscopy: a comparison of frog, miips and g-miips A Comin, M Rhodes, R Ciesielski, R Trebino, A Hartschuh CLEO: Science and Innovations, SW1H. 5, 2015 | 5 | 2015 |
| Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology R Ciesielski, LM Lohr, H Mertens, AL Charley, R de Ruyter, ... Metrology, Inspection, and Process Control XXXVII 12496, 447-455, 2023 | 4 | 2023 |
| A new sample chamber for hybrid detection of scattering and fluorescence, using synchrotron radiation in the soft x-ray and extreme ultraviolet (EUV) spectral range R Ciesielski, LM Lohr, AF Herrero, A Fischer, A Grothe, H Mentzel, ... Review of Scientific Instruments 94 (1), 2023 | 3 | 2023 |
| High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments V Soltwisch, S Glabisch, A Andrle, V Philipsen, Q Saadeh, S Schröder, ... 37th European Mask and Lithography Conference 12472, 123-134, 2022 | 2 | 2022 |
| Small target compatible dimensional and analytical metrology for semiconductor nanostructures using x-ray fluorescence techniques P Hönicke, Y Kayser, V Soltwisch, A Wählisch, N Wauschkuhn, ... Metrology, Inspection, and Process Control XXXVII 12496, 421-427, 2023 | 1 | 2023 |
| Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks Q Saadeh, H Mesilhy, V Soltwisch, A Erdmann, R Ciesielski, L Lohr, ... Photomask Technology 2022 12293, 288-299, 2022 | 1 | 2022 |
