| Hybrid metrology: from the lab into the fab A Vaid, A Elia, G Iddawela, C Bozdog, M Sendelbach, BC Kang, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 13 (4), 041410-041410, 2014 | 18 | 2014 |
| Implementation of hybrid metrology at HVM fab for 20nm and beyond A Vaid, L Subramany, G Iddawela, C Ford, J Allgair, G Agrawal, J Taylor, ... Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 14 | 2013 |
| Implementation of machine learning for high-volume manufacturing metrology challenges P Timoney, T Kagalwala, E Reis, H Lazkani, J Hurley, H Liu, C Kang, ... Metrology, Inspection, and Process Control for Microlithography XXXII 10585 …, 2018 | 12 | 2018 |
| Integrated Metrology’s role in Gas Cluster Ion Beam etch T Kagalwala, C Kang ASMC, 72 - 77, 2015 | 7 | 2015 |
| Hybrid enabled thin film metrology using XPS and optical A Vaid, G Iddawela, S Mahendrakar, M Lenahan, M Hossain, P Timoney, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 6 | 2016 |
| Improved scatterometry time-to-solution using virtual reference A Vaid, G Iddawela, J Tsai, G Wainreb, P Isbester, BCC Kang, M Klots, ... Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015 | 6 | 2015 |
| Comprehensive BEOL control using scatterometry and APC P Timoney, J Tsai, S Baral, L Economikos, A Vaid, H Lu, B Kang, ... Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015 | 6 | 2015 |
| Improving Metrology Fleet KPIs for Advanced Foundry Manufacturing T Kagalwala, P Timoney, R Fiege, J Emans, T Hughes, A Elia, A Vaid, ... 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2019 | 2 | 2019 |
| Complex metrology on 3D structures using multi-channel OCD T Kagalwala, S Mahendrakar, A Vaid, PK Isbester, A Cepler, C Kang, ... Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | 2 | 2017 |
| Hybrid metrology implementation: server approach C Osorio, P Timoney, A Vaid, A Elia, C Kang, C Bozdog, N Yellai, ... Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015 | 2 | 2015 |
| Process control of semiconductor fabrication based on linkage between different fabrication steps P Timoney, T Kagalwala, A Vaid, S Mahendrakar, D Dixit, S Yogev, ... US Patent App. 16/288,152, 2020 | | 2020 |
| Hybrid Metrology Implementation: Server Approach SPIE Advanced Lithography 9424, 2015 | | 2015 |
